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Improvement of wettability
Vacuum Pump-Rotary Piston
a module-to-substrate distance of 1 to 5 mm is recommended
SA00015 Available CPC quick release connectors
Conflat (non-rotatable) blank flanges with Tapped holes
Chromium Sputter Target [Cr] Diameter:3" [76.2mm] Improvement of wettabilityChromium [Cr] Sputter Target used for Magnetron Sputtering Physical Vapour Deposition. Various diameters, thicknesses and purities available to suit all major sputter source manufacturers. If you require a custom geometry, purity or design then please do not hesitate to contact us for a quotation. All our materials are tested using ICP OES chemical analysis and manufactured under ISO9001: 2008 certification. Materials are vacuum packed under cleanroom
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